About
Kristina Paabus (USA/EE) is a multidisciplinary visual artist with a focus in printmaking. Her work examines systems of power and control, with a particular focus on Soviet and Post-Soviet histories. Earning her BFA from the Rhode Island School of Design and MFA from the School of the Art Institute of Chicago, Paabus also studied Fine Arts and Religious Studies at University of Massachusetts-Amherst and Printmaking at The Estonian Academy of Arts. Her work has been exhibited throughout the United States, Europe, and China, with recent solo exhibitions including Meanwhile at Hobusepea Galerii (Estonia) and Something to Believe In at the McDonough Museum of Art (OH). Paabus is the recipient of a Fulbright Fellowship for Installation Art in Estonia, the Grant Wood Fellowship in Printmaking at The University of Iowa, an Ohio Arts Council Individual Excellence Award, the Southern Graphics Council International Guanlan Residency Award, and Oberlin College faculty grants. Kristina has attended numerous artist residences such as ACRE (WI), Ox-Bow (MI), Women’s Studio Workshop (NY), Emmanuel College (MA), Inside Zone (Romania), Culture Factory Polymer (Estonia), SÍM (Iceland), MUHU A.I. (Estonia), Kimmel Harding Nelson (NE), Guanlan Original Printmaking Base (China), NCCA Kronstadt (Russia), Anderson Ranch Art Center (CO), KALA (CA), Soaring Gardens (PA), Grafodroom (Estonia), Estonian Academy of Arts-Graafika (Estonia), TYPA (Estonia), and St. Michael's Printshop (Canada). Institutions that have collected her work include Cleveland Clinic, University of Iowa Art Museum, China Printmaking Museum, DePaul Art Museum, Progressive Insurance, Harvard Art Museums, and University of California-Berkeley Libraries. She has taught at the School of the Art Institute of Chicago, Ox-Bow School of Art, The University of Iowa, Penland School of Craft, and The Estonian Academy of Arts. Paabus lives and works in Northeast Ohio, where she is Department Chair and Associate Professor of Studio Art in Reproducible Media at Oberlin College.